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1

Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 395 KB

english, 2014

2

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.72 MB

english, 2014

3

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 679 KB

english, 2015

4

Effects of effective reaction radius for neutralization on performance of chemically amplified resists

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.27 MB

english, 2014

5

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.04 MB

english, 2014

6

In situ Characterization of Photoresist Dissolution

Itani, Toshiro, Santillan, Julius Joseph

Journal:

Applied Physics Express

Year:

2010

Language:

english

File:

PDF, 1.35 MB

english, 2010

7

In situ characterization of nano-scale pattern roughness during resist dissolution process

Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Journal:

Microelectronic Engineering

Year:

2015

Language:

english

File:

PDF, 1.11 MB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of resist material and process for hp-2x-nm devices using EUV lithography

Matsunaga, Kentaro, Oizumi, Hiroaki, Kaneyama, Koji, Shiraishi, Gousuke, Matsumaro, Kazuyuki, Santillan, Julius Joseph, Itani, Toshiro, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 6.85 MB

english, 2010

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Stochastic effects in fabrication of 11nm line-and-space patterns using extreme ultraviolet lithography

Wood, Obert R., Panning, Eric M., Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 217 KB

english, 2014

10

Alternative Developer Solutions and Processes for EUV and ArFi Lithography

Harumoto, Masahiko, Santillan, Julius Joseph, Nakayama, Chisayo, Tanaka, Yuji, Motono, Tomohiro, Asai, Masaya, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

File:

PDF, 1.35 MB

2019

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Quantification of the resist dissolution process: an in situ analysis using high speed atomic force microscopy

Hohle, Christoph K., Younkin, Todd R., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2016

Language:

english

File:

PDF, 2.13 MB

english, 2016

12

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - A study of EUV resist outgassing characteristics using a novel outgas analysis system

Santillan, Julius Joseph, Lin, Qinghuang, Toriumi, Minoru, Itani, Toshiro

Year:

2007

Language:

english

File:

PDF, 302 KB

english, 2007

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Base quencher effects in chemically amplified resist at sub-30-nm fabrication

Henderson, Clifford L., Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro

Year:

2008

Language:

english

File:

PDF, 176 KB

english, 2008

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - EUV resist processing with flash-lamp

Santillan, Julius Joseph, Kaneyama, Koji, Morita, Akihiko, Fuse, Kazuhiko, Kiyama, Hiroki, Asai, Masaya, Itani, Toshiro, Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 1.71 MB

english, 2012

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Alternative resist processes for LWR reduction in EUVL

La Fontaine, Bruno M., Kaneyama, Koji, Matsunaga, Kentaro, Shiraishi, Gousuke, Santillan, Julius Joseph, Itani, Toshiro

Year:

2010

Language:

english

File:

PDF, 1.23 MB

english, 2010

16

Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 376 KB

english, 2008

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - The effect of resist dissolution process on pattern formation variability: an in situ analysis using high-speed atomic force microscopy

Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 1.79 MB

english, 2015

18

Fluorinated-Polymer Based High Sensitivity Extreme Ultraviolet Resists

Santillan, Julius Joseph, Yamashita, Tsuneo, Morita, Masamichi, Tanaka, Yoshito, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 291 KB

english, 2010

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - An in situ analysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopy

Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 4.92 MB

english, 2014

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Modeling and simulation of acid diffusion in chemically amplified resists with polymer-bound acid generator

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 509 KB

english, 2012

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - High-sensitivity EUV resists based on fluorinated polymers

Yamashita, Tsuneo, Allen, Robert D., Somervell, Mark H., Morita, Masamichi, Tanaka, Yoshito, Santillan, Julius Joseph, Itani, Toshiro

Year:

2011

Language:

english

File:

PDF, 709 KB

english, 2011

22

Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.03 MB

english, 2014

23

In situ analysis of negative-tone resist pattern formation using organic-solvent-based developer process

Santillan, Julius Joseph, Yamada, Keisaku, Itani, Toshiro

Journal:

Applied Physics Express

Year:

2014

Language:

english

File:

PDF, 705 KB

english, 2014

24

Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 468 KB

english, 2012

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Quantitative analysis of EUV resist outgassing

Henderson, Clifford L., Kobayashi, Shinji, Santillan, Julius Joseph, Itani, Toshiro

Year:

2008

Language:

english

File:

PDF, 697 KB

english, 2008

26

Relationship between Sensitization Distance and Photon Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2017

File:

PDF, 2.09 MB

2017

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - EUV resist development in Selete

Henderson, Clifford L., Kawamura, Daisuke, Kaneyama, Koji, Kobayashi, Shinji, Santillan, Julius Joseph S., Itani, Toshiro

Year:

2008

Language:

english

File:

PDF, 2.07 MB

english, 2008

28

Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 54 KB

english, 2014

29

Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 144 KB

english, 2008

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Performance of EUV molecular resists based on fullerene derivatives

Oizumi, Hiroaki, Allen, Robert D., Somervell, Mark H., Matsunaga, Kentaro, Kaneyama, Koji, Santillan, Julius Joseph, Shiraishi, Gousuke, Itani, Toshiro

Year:

2011

Language:

english

File:

PDF, 9.78 MB

english, 2011

31

Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 165 KB

english, 2014

32

Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11 nm half-pitch line-and-space patterns using extreme-ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2018

Language:

english

File:

PDF, 674 KB

english, 2018

33

Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

Language:

english

File:

PDF, 564 KB

english, 2019

34

Alternative Developer Solutions and Processes for EUV and ArFi Lithography

Harumoto, Masahiko, Santillan, Julius Joseph, Nakayama, Chisayo, Tanaka, Yuji, Motono, Tomohiro, Asai, Masaya, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

Language:

english

File:

PDF, 1.35 MB

english, 2019

35

Outgassing Quantification Analysis of Extreme Ultraviolet Resists

Santillan, Julius Joseph, Kobayashi, Shinji, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

File:

PDF, 1.13 MB

2008

36

Extreme Ultraviolet Resist Outgassing Quantification Verification by Resist Film Analysis

Kobayashi, Shinji, Santillan, Julius Joseph, Oizumi, Hiroaki, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 739 KB

english, 2009

37

Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 200 KB

english, 2008

38

Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Applied Physics Express

Year:

2013

Language:

english

File:

PDF, 1.08 MB

english, 2013

39

Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.07 MB

english, 2014

40

Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

Fujii, Shinya, Kozawa, Takahiro, Okamoto, Kazumasa, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 796 KB

english, 2015

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Relationships between EUV resist outgassing and contamination deposition at Selete

Oizumi, Hiroaki, La Fontaine, Bruno M., Naulleau, Patrick P., Matsumaro, Kazuyuki, Nomura, Satoshi, Santillan, Julius Joseph, Itani, Toshiro, Watanabe, Takeo, Matsuda, Naohiro, Harada, Tetsuo, Kinoshi

Year:

2011

Language:

english

File:

PDF, 1.63 MB

english, 2011

42

EUV resist outgassing release characterization and analysis

Shinji Kobayashi, Julius Joseph Santillan, Hiroaki Oizumi, Toshiro Itani

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 939 KB

english, 2009

43

Effect of thermalization distance on chemical gradient of line-and-space patterns with 7 nm half-pitch in chemically amplified extreme ultraviolet resists

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 313 KB

english, 2015

44

[IEEE 2007 Digest of papers Microprocesses and Nanotechnology - Kyoto, Japan (2007.11.5-2007.11.8)] 2007 Digest of papers Microprocesses and Nanotechnology - Effects of rate constant for deprotection reaction on latent image formation in chemically amplified EUV resists

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro

Year:

2007

Language:

english

File:

PDF, 549 KB

english, 2007

45

The Photopolymer Science and Technology Award

Itani, Toshiro, Santillan, Julius Joseph

Journal:

Journal of Photopolymer Science and Technology

Year:

2011

Language:

english

File:

PDF, 80 KB

english, 2011

46

Impact of Nonconstant Diffusion Coefficient on Latent Image Quality in 22nm Fabrication using Extreme Ultraviolet Lithography

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2008

File:

PDF, 536 KB

2008

47

Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2015

Language:

english

File:

PDF, 250 KB

english, 2015

48

Alternative developer solutions for extreme ultraviolet resist

Itani, Toshiro, Santillan, Julius Joseph

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2009

Language:

english

File:

PDF, 901 KB

english, 2009

49

Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement

Fujii, Shinya, Kozawa, Takahiro, Okamoto, Kazumasa, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 867 KB

english, 2015

50

Challenges in Development of Sub-10 nm Resist Materials

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2016

Language:

english

File:

PDF, 602 KB

english, 2016

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